Shin-Etsu's Synthetic Quartz Photomask Substrate “KNFS6025”

[Pages:7]Shin-Etsu 's Synthetic Quartz Photomask Substrate

Shin-Etsu 's Synthetic Quartz Photomask Substrate

"KNFS6025 "

for Polarized ArF Lithography

Optimum Substrate for High-NA and Immersion Lithography

Contact : Division of Advanced Materials , Shin-Etsu Chemical Co., Ltd.

Chome, Otemachi, Chiyoda-ku, Tokyo, 100-0004, JAPAN Phone: 03-3246-5222 ; FAX: 03-3246-6839 ; Email: r_nakata@shinetsu.jp ; Homepage:

Shin-Etsu's Synthetic Quartz Photomask Substrate

"KNFS6025 " for ArF High-NA and Immersion Lithography

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Laser source

Wavelength

Optics

Substrate grade

Transmission at 193nm

(Distribution in a surface T)

Durability

to ArF

(10mJ/cm2 pulse,

2106pulses)

Birefrigence

(nm / 6.35mm at 193nm)

Flatness

Non-

polarized

2nm

0.5?m

system

Dry

ArF 193.4nm Polarized system

KNFS6025

5

5SBOTNJTTJPO

MPTT

2nm1nm

0.50.25?m

Immersion

1nm or less

Special use

XNFS6025

5

Up to use

Laser Durability against ArF Excimer Laser (1)

Shin-Etsu's photomask substrate for ArF lithography keeps high transmission property even after practically high level dose of ArF excimer laser.

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5SBOTNJTTJPO

Result of accelerated test

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10mJ/cm2pulse200Hz5.0?104pulses

Laser-induced absorption

[E' center (Si formation]

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"GUFSJSSBEJBUJPO

8BWFMFOHUI ON

,/'4"S'HSBEF

10mJ/cm2pulse200Hz5.0?104pulses

Suppression of laser-induced absorption

8BWFMFOHUI ON

Laser Durability against ArF Excimer Laser (2)

Shin-Etsu's photomask substrate for ArF lithography keeps high transmission property even after practically high level dose of ArF excimer laser.

Result of accelerated test

10mJ/cm2pulse200Hz

Transmission (%)

SZS6025

XNFS6025

KNFS6025

The number of pulses shot (105 pulses)

Miscellaneous Properties

Optical properties, mechanical properties and thermal properties of Shin-Etsu's photomask substrate for ArF lithography are shown below. Reflactive index will be important for Levenson masks, CPL masks, etc.

Optical Properties

Substrates for ArF KNFS6025 XNFS6025

ON

Refractive Index

ON

for KrF SZS6025

Substrates for ArF

.FDIBOJDBM Properties

KNFS6025 XNFS6025

Young's modulus LHNN

Shear modulus

LHNN

Poisson's ratio

Specific gravity

HDN

for KrF SZS6025

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Thermal Properties

Coefficient of thermal expansion

,

Strain point

^

Annealing point

^

Substrates for ArF

for KrF

KNFS6025 XNFS6025 SZS6025

^ ^ ^

XBWFMFOHUION

Low Birefringence Grade for ArF High-NA Lithography

Shin-Etsu can add the property of low birefringence to the next generation photomask substrate for ArF High-NA and immersion lithography.

Tentative specification

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#JSFGSJOHFODFONNNBUXBWFMFOHUIPGON

An example map of low birefringence KNFS6025

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6.35mm-thick-Birefringence 0.38nm at wavelength of 633nm

corresponds to 0.57nm at 193.4nm

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$POWFSTJPOPGCJSFGSJOHFODF 3F XBWFMFOHUIO JOEFY

3F ON

$ ON

3F ON

$ ON

$

$

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O

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"S'XBWFMFOHUI ON

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Shin-Etsu's Surface Technologies

Shin-Etsu supplies smooth, low-defect-density and highly flat surface for the photomask substrate for ArF lithography. Shin-Etsu manufactures a 0.5 ?m-flatness substrate as a standard flatness grade for the photomask substrate for ArF lithography.

Flatness

Roughness

Defect

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'MBUOFTT5*3N %PNFTIBQF

Flatness grades

Grade Flatness & N

Comments

&4 N A certain shape to your option

& N & N

Special use

by AFM

Low Surface Roughness Rms(1?m)0.2nm

Low-Defect-Density Surface (called LD-SZS) The number of 0.5?m-defects counts 20

(Standard grade with sampling inspection by MAGICS)

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