FORECASTING AVIATION ACTIVITY
Hughes Aircraft Co. soon ready to commit ion implantation techniques to production of both MOS and avalanche (IMPATT) diodes. 1968 Dec 20 L. Eriksson, G. Fladda, & K. Bjorkqvist, "Influence of n-type dopants on the lattice location of implanted p-type dopants in Si and Ge," Appl. Phys. Lett. ................
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