SEMI M1-0915
TXRF has been standardized both with (ISO 17331) and without (ISO 14706) use of VPD to preconcentrate the surface metal contaminants. VPD is chemical preconcentration of the surface metals using vapor phase HF to decompose the surface native oxide and a water (or acid-spiked water) droplet to scan across the wafer dissolving the surface metals. ................
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