Background Statement for SEMI Draft Document XXXX

SEMI MF1618 — Practice for Determination of Uniformity of Thin Films on Silicon Wafers. SEMI MF1810 — Test Method for Counting Preferentially Etched or Decorated Surface Defects in Silicon Wafers. ANSI Standard1. ANSI/ASME B46.1 — Surface Texture (Surface Roughness, Waviness, and Lay) ISO Standards5 ................
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